صورة الغلاف

Study of Semi-Recessed LOCOS for Quasi-nanoscale CMOS Device Isolation

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محفوظ في:

التفاصيل البيبلوغرافية
المؤلف الرئيسي:	Mohamad Idzham Abd Sani
مؤلفون آخرون:	Zaliman Sauli, P.M. (Advisor)
التنسيق:	Learning Object
اللغة:	English
منشور في:	Universiti Malaysia Perlis 2008
الموضوعات:	Metal oxide semiconductors, Complementary CMOS device isolation Semiconductor manufacturing Silicon Local oxidation of silicon (LOCOS)
الوصول للمادة أونلاين:	http://dspace.unimap.edu.my/xmlui/handle/123456789/1362
الوسوم:	إضافة وسم لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!

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