Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist
This study shows that poly(methyl methacrylate) (PMMA) 950 thick photoresist is a promising polymer for ion-track nanolithography templates for nanomaterials fabrication resulting in high aspect ratio nanostructures ranging from 100 to 500 with highly selective etch rates when using deep ultraviolet...
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| Main Authors: | , , , , , , , |
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| Format: | Article |
| Published: |
Jpn. J. Appl. Phys.
2010
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| Subjects: | |
| Online Access: | http://eprints.utem.edu.my/id/eprint/4371/ http://jjap.jsap.jp/link?JJAP/49/06GE07/ |
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