APA Citation

Koukharenko, E. (2010). Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist. Jpn. J. Appl. Phys.

Chicago Style Citation

Koukharenko, Elena. Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl Methacrylate) 950 Photoresist. Jpn. J. Appl. Phys, 2010.

MLA Citation

Koukharenko, Elena. Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl Methacrylate) 950 Photoresist. Jpn. J. Appl. Phys, 2010.

Warning: These citations may not always be 100% accurate.