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Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist

This study shows that poly(methyl methacrylate) (PMMA) 950 thick photoresist is a promising polymer for ion-track nanolithography templates for nanomaterials fabrication resulting in high aspect ratio nanostructures ranging from 100 to 500 with highly selective etch rates when using deep ultraviolet...

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書目詳細資料
Main Authors:	Koukharenko, Elena, Jekaterina , Kuleshova, Fowler, Marcel, Kok, Swee Leong, Tudor, Michael J., Beeby, Stephen P., Nandhakumar, Iris, White, Neil
格式:	Article
出版:	Jpn. J. Appl. Phys. 2010
主題:	TK Electrical engineering. Electronics Nuclear engineering
在線閱讀:	http://eprints.utem.edu.my/id/eprint/4371/ http://jjap.jsap.jp/link?JJAP/49/06GE07/
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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