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Characterization of electrostatic discharge threshold voltage of phase-shift mask reticle

A reticle is a stencil used in lithography process for forming integrated circuit (IC) on silicon substrate. It consists of a thin (100 nm) coating of masking metallic patterned (features) with critical dimension (CD) of nanometers on a thicker quartz substrate. The features can be damaged by electr...

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書誌詳細
主要な著者:	Razman, Harriman, Awang Md Isa, Azmi, Suaidi, Mohamad Kadim, Chik, Mohd Azizi
フォーマット:	論文
言語:	English
出版事項:	Institute Of Advanced Engineering And Science (IAES) 2022
オンライン･アクセス:	http://eprints.utem.edu.my/id/eprint/26201/2/24876-50758-1-PB.PDF http://eprints.utem.edu.my/id/eprint/26201/ https://ijece.iaescore.com/index.php/IJECE/article/view/24876/15469
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