Experimental quantification of electrostatic damage (ESD) in binary reticle with feature of nanometre scale gaps
A Binary reticle for lithography circuit patterning is extremerly senstive to electrostatic field. Damaged is seen on its feature after a breakdown voltage occurred between the metal lines. The experimental quantification of ESD for Binary reticle is performed by direct discharge to the feature of C...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wydawnictwo SIGMA-NOT
2022
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| Online Access: | http://eprints.utem.edu.my/id/eprint/26215/2/ARTICLE%20PUBLISHED%20EXPERIMENTAL%20QUANTIFICATION%20OF%20ESD%20IN%20BINARY%20RETICLE.PDF http://eprints.utem.edu.my/id/eprint/26215/ http://pe.org.pl/articles/2022/3/14.pdf |
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