Hot Carrier Studies on Heterostructure Silicon Germanium P-Channel Metal Oxide Semiconductor Field Effect Transistor
This study examines the susceptibility of hot carrier effects on various Heterostructures Silicon Germanium P-Channel Metal Oxide Semiconductor Field Effect Transistor (SiGe PMOSFET) such as Strained SiGe Channel and Strained SiGe Source/Drain PMOSFET. The results were compared with Si Channel PMOSF...
Saved in:
Main Author: | Gan, Kenny Chye Siong |
---|---|
Format: | Thesis |
Language: | English English |
Published: |
2004
|
Online Access: | http://psasir.upm.edu.my/id/eprint/528/1/549631_FK_2004_89.pdf http://psasir.upm.edu.my/id/eprint/528/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Electrical and temperature characterisation of silicon and germanium nanowire transistors based on channel dimensions
by: Hani Taha, Abd Assamad Al Ariqi
Published: (2020) -
Vertical channel structure and ballistic carrier transport of nanoscale metal oxide semiconductor field effect transistor
by: Saad, Ismail
Published: (2009) -
Silicon n-Channel Metal Oxide
Semiconductor Field Effect Transistor
Fabrication And Its Effect On Output
Characteristics
by: Mohd Rashid, Mohd Marzaini
Published: (2012) -
Simulation and modeling of curved channel metal oxide semiconductor field effect transistor
by: Suseno, Jatmiko Endro
Published: (2012) -
Quantum mechanical effects on the performance of strained silicon metal-oxide-semiconductor field-effect transistor
by: Kang, Eng Siew
Published: (2013)