Analyze of input process parameter variation on threshold voltage in 45nm n-channel MOSFET
In this paper, Taguchi method was used to analyze of input process parameters variations on threshold voltage (V TH) in 45nm n-channel Metal Oxide Semiconductor device. The orthogonal array, the signal-to-noise ratio, and analysis of variance are employed to study the performance characteristics of...
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Format: | Conference Proceeding |
| Published: |
2017
|
| Online Access: | http://dspace.uniten.edu.my:80/jspui/handle/123456789/5236 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Be the first to leave a comment!