Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots...
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| 主要な著者: | , , , |
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| フォーマット: | 論文 |
| 出版事項: |
Trans Tech Publications
2016
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| 主題: | |
| オンライン･アクセス: | http://eprints.intimal.edu.my/755/ https://www.scientific.net/KEM.701.42 |
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