Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots...
保存先:
| 主要な著者: | , , , |
|---|---|
| フォーマット: | 論文 |
| 出版事項: |
Trans Tech Publications
2016
|
| 主題: | |
| オンライン･アクセス: | http://eprints.intimal.edu.my/755/ https://www.scientific.net/KEM.701.42 |
| タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|
| 要約: | This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases. |
|---|