Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots...
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| Main Authors: | , , , |
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| Format: | Article |
| Published: |
Trans Tech Publications
2016
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| Subjects: | |
| Online Access: | http://eprints.intimal.edu.my/755/ https://www.scientific.net/KEM.701.42 |
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