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Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite

This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots...

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Main Authors: Low, Andrew Chun Wey, Damideh, Vahid, Saw, S. H., Lim, Chin Seong
Format: Article
Published: Trans Tech Publications 2016
Subjects:
QC Physics
Online Access:http://eprints.intimal.edu.my/755/
https://www.scientific.net/KEM.701.42
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spelling my-inti-eprints.7552017-03-22T05:58:45Z http://eprints.intimal.edu.my/755/ Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite Low, Andrew Chun Wey Damideh, Vahid Saw, S. H. Lim, Chin Seong QC Physics This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases. Trans Tech Publications 2016 Article PeerReviewed Low, Andrew Chun Wey and Damideh, Vahid and Saw, S. H. and Lim, Chin Seong (2016) Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite. Key Engineering Materials, 701. pp. 42-46. ISSN 1662-9795 https://www.scientific.net/KEM.701.42 10.4028/www.scientific.net/KEM.701.42
institution INTI International University
building INTI Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider INTI International University
content_source INTI Institutional Repository
url_provider http://eprints.intimal.edu.my
topic QC Physics
spellingShingle QC Physics
Low, Andrew Chun Wey
Damideh, Vahid
Saw, S. H.
Lim, Chin Seong
Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
description This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases.
format Article
author Low, Andrew Chun Wey
Damideh, Vahid
Saw, S. H.
Lim, Chin Seong
author_facet Low, Andrew Chun Wey
Damideh, Vahid
Saw, S. H.
Lim, Chin Seong
author_sort Low, Andrew Chun Wey
title Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
title_short Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
title_full Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
title_fullStr Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
title_full_unstemmed Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
title_sort process development and optimization of carbon-based thin film deposition through ablation of graphite
publisher Trans Tech Publications
publishDate 2016
url http://eprints.intimal.edu.my/755/
https://www.scientific.net/KEM.701.42
_version_ 1644541295113273344
score 13.211869

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