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Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite

This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots...

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Main Authors:	Low, Andrew Chun Wey, Damideh, Vahid, Saw, S. H., Lim, Chin Seong
格式:	Article
出版:	Trans Tech Publications 2016
主题:	QC Physics
在线阅读:	http://eprints.intimal.edu.my/755/ https://www.scientific.net/KEM.701.42
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