Characterization of electrostatic discharge threshold voltage of phase-shift mask reticle
A reticle is a stencil used in lithography process for forming integrated circuit (IC) on silicon substrate. It consists of a thin (100 nm) coating of masking metallic patterned (features) with critical dimension (CD) of nanometers on a thicker quartz substrate. The features can be damaged by electr...
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| 主要な著者: | , , , |
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| フォーマット: | 論文 |
| 言語: | English |
| 出版事項: |
Institute Of Advanced Engineering And Science (IAES)
2022
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| オンライン･アクセス: | http://eprints.utem.edu.my/id/eprint/26201/2/24876-50758-1-PB.PDF http://eprints.utem.edu.my/id/eprint/26201/ https://ijece.iaescore.com/index.php/IJECE/article/view/24876/15469 |
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