Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method

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Main Authors: Mohammad Nuzaihan, Md Nor, Uda, Hashim, Prof. Dr., Nazwa, Taib, Tijjani Adam, Shuwa
Other Authors: m.nuzaihan@unimap.edu.my
Format: Article
Language:English
Published: Trans Tech Publications 2014
Subjects:
BOE
EBL
Online Access:http://dspace.unimap.edu.my:80/dspace/handle/123456789/33553
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spelling my.unimap-335532014-04-09T06:24:03Z Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method Mohammad Nuzaihan, Md Nor Uda, Hashim, Prof. Dr. Nazwa, Taib Tijjani Adam, Shuwa m.nuzaihan@unimap.edu.my uda@unimap.edu.my nazawa_nice@yahoo.com tijjaniadam@yahoo.com Advance nanolithography Atomic force microscopy (AFM) BOE EBL Inductively coupled plasma-reactive ion etching ma-N2400 negative resist Silicon nanowire Size-reduction Thermal oxidation Link to publisher's homepage at http://www.ttp.net/ A simple method for the fabrication of silicon nanowires using Electron Beam Lithography (EBL) combined with thermal oxidation size reduction method is presented. EBL is used to define the initial silicon nanowires of dimensions approximately 100 nm. Size-reduction method is employed for reaching true nanoscale of dimensions approximately 20 nm. Dry oxidation of silicon is well investigated process for self-limited size-reduction of silicon nanowires. In this paper, successful size reduction of silicon nanowires is presented and surface topography characterizations using Atomic Force Microscopy (AFM) are reported. 2014-04-09T06:24:03Z 2014-04-09T06:24:03Z 2014 Article Advanced Materials Research, vol.832, 2014, pages 415-418 1662-8985 http://dspace.unimap.edu.my:80/dspace/handle/123456789/33553 http://www.scientific.net/AMR.832.415 10.4028/www.scientific.net/AMR.832.415 en Trans Tech Publications
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Advance nanolithography
Atomic force microscopy (AFM)
BOE
EBL
Inductively coupled plasma-reactive ion etching
ma-N2400 negative resist
Silicon nanowire
Size-reduction
Thermal oxidation
spellingShingle Advance nanolithography
Atomic force microscopy (AFM)
BOE
EBL
Inductively coupled plasma-reactive ion etching
ma-N2400 negative resist
Silicon nanowire
Size-reduction
Thermal oxidation
Mohammad Nuzaihan, Md Nor
Uda, Hashim, Prof. Dr.
Nazwa, Taib
Tijjani Adam, Shuwa
Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
description Link to publisher's homepage at http://www.ttp.net/
author2 m.nuzaihan@unimap.edu.my
author_facet m.nuzaihan@unimap.edu.my
Mohammad Nuzaihan, Md Nor
Uda, Hashim, Prof. Dr.
Nazwa, Taib
Tijjani Adam, Shuwa
format Article
author Mohammad Nuzaihan, Md Nor
Uda, Hashim, Prof. Dr.
Nazwa, Taib
Tijjani Adam, Shuwa
author_sort Mohammad Nuzaihan, Md Nor
title Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
title_short Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
title_full Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
title_fullStr Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
title_full_unstemmed Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
title_sort fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
publisher Trans Tech Publications
publishDate 2014
url http://dspace.unimap.edu.my:80/dspace/handle/123456789/33553
_version_ 1643797208980520960
score 13.211869