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HRTEM analysis of magnetron sputtered Ni4Al thin films

The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope (TEM). An expansion of the lattice by nearly 5% was observed for the synthesized films in their low-thickness and...

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Main Authors: Thangaraj, Joseph Sahaya Anand, Mohd Abid, Mohd Asyadi 'Azam, Subramonian, Sivarao, Buang, Zolkepli, K.M.Rajan, Rajes, Mat Yusoff, Nurul Hazliza, Abdul Aziz, Mohd Zaidan, Chua, Kok Yau
Format: Article
Language:English
Published: Trans Tech Publications 2015
Online Access:http://eprints.utem.edu.my/id/eprint/14327/1/41_AMM_761.pdf
http://eprints.utem.edu.my/id/eprint/14327/
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spelling my.utem.eprints.143272023-05-24T16:02:28Z http://eprints.utem.edu.my/id/eprint/14327/ HRTEM analysis of magnetron sputtered Ni4Al thin films Thangaraj, Joseph Sahaya Anand Mohd Abid, Mohd Asyadi 'Azam Subramonian, Sivarao Buang, Zolkepli K.M.Rajan, Rajes Mat Yusoff, Nurul Hazliza Abdul Aziz, Mohd Zaidan Chua, Kok Yau The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope (TEM). An expansion of the lattice by nearly 5% was observed for the synthesized films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni4Al films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. A grain coalescence trend was found for the Ni4Al films during the in situ annealing above 500°C. This can be the main reason for the abnormal grain growth of these films at these high temperatures. Trans Tech Publications 2015-03-01 Article PeerReviewed text en http://eprints.utem.edu.my/id/eprint/14327/1/41_AMM_761.pdf Thangaraj, Joseph Sahaya Anand and Mohd Abid, Mohd Asyadi 'Azam and Subramonian, Sivarao and Buang, Zolkepli and K.M.Rajan, Rajes and Mat Yusoff, Nurul Hazliza and Abdul Aziz, Mohd Zaidan and Chua, Kok Yau (2015) HRTEM analysis of magnetron sputtered Ni4Al thin films. Applied Mechanics and Materials, 761. pp. 504-509. ISSN 1660-9336 doi:10.4028/www.scientific.net/AMM.761.504
institution Universiti Teknikal Malaysia Melaka
building UTEM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknikal Malaysia Melaka
content_source UTEM Institutional Repository
url_provider http://eprints.utem.edu.my/
language English
description The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope (TEM). An expansion of the lattice by nearly 5% was observed for the synthesized films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni4Al films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. A grain coalescence trend was found for the Ni4Al films during the in situ annealing above 500°C. This can be the main reason for the abnormal grain growth of these films at these high temperatures.
format Article
author Thangaraj, Joseph Sahaya Anand
Mohd Abid, Mohd Asyadi 'Azam
Subramonian, Sivarao
Buang, Zolkepli
K.M.Rajan, Rajes
Mat Yusoff, Nurul Hazliza
Abdul Aziz, Mohd Zaidan
Chua, Kok Yau
spellingShingle Thangaraj, Joseph Sahaya Anand
Mohd Abid, Mohd Asyadi 'Azam
Subramonian, Sivarao
Buang, Zolkepli
K.M.Rajan, Rajes
Mat Yusoff, Nurul Hazliza
Abdul Aziz, Mohd Zaidan
Chua, Kok Yau
HRTEM analysis of magnetron sputtered Ni4Al thin films
author_facet Thangaraj, Joseph Sahaya Anand
Mohd Abid, Mohd Asyadi 'Azam
Subramonian, Sivarao
Buang, Zolkepli
K.M.Rajan, Rajes
Mat Yusoff, Nurul Hazliza
Abdul Aziz, Mohd Zaidan
Chua, Kok Yau
author_sort Thangaraj, Joseph Sahaya Anand
title HRTEM analysis of magnetron sputtered Ni4Al thin films
title_short HRTEM analysis of magnetron sputtered Ni4Al thin films
title_full HRTEM analysis of magnetron sputtered Ni4Al thin films
title_fullStr HRTEM analysis of magnetron sputtered Ni4Al thin films
title_full_unstemmed HRTEM analysis of magnetron sputtered Ni4Al thin films
title_sort hrtem analysis of magnetron sputtered ni4al thin films
publisher Trans Tech Publications
publishDate 2015
url http://eprints.utem.edu.my/id/eprint/14327/1/41_AMM_761.pdf
http://eprints.utem.edu.my/id/eprint/14327/
_version_ 1768012347215970304
score 13.244368

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