HRTEM analysis of magnetron sputtered Ni4Al thin films
The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope (TEM). An expansion of the lattice by nearly 5% was observed for the synthesized films in their low-thickness and...
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| Main Authors: | , , , , , , , |
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| 格式: | Article |
| 語言: | English |
| 出版: |
Trans Tech Publications
2015
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| 在線閱讀: | http://eprints.utem.edu.my/id/eprint/14327/1/41_AMM_761.pdf http://eprints.utem.edu.my/id/eprint/14327/ |
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| 總結: | The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope (TEM). An expansion of the lattice by nearly 5% was observed for the synthesized films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni4Al films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. A grain coalescence trend was found for the Ni4Al films during the in situ annealing above 500°C. This can be the main reason for the abnormal grain growth of these films at these high temperatures. |
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