Hot Carrier Studies on Heterostructure Silicon Germanium P-Channel Metal Oxide Semiconductor Field Effect Transistor

This study examines the susceptibility of hot carrier effects on various Heterostructures Silicon Germanium P-Channel Metal Oxide Semiconductor Field Effect Transistor (SiGe PMOSFET) such as Strained SiGe Channel and Strained SiGe Source/Drain PMOSFET. The results were compared with Si Channel PMOSF...

詳細記述

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書誌詳細
第一著者: Gan, Kenny Chye Siong
フォーマット: 学位論文
言語:English
English
出版事項: 2004
オンライン・アクセス:http://psasir.upm.edu.my/id/eprint/528/1/549631_FK_2004_89.pdf
http://psasir.upm.edu.my/id/eprint/528/
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