Impact of ar flow rates on micro-structural properties of ws2 thin film by rf magnetron sputtering
Tungsten disulfide (WS2) thin films were deposited on soda-lime glass (SLG) substrates using radio frequency (RF) magnetron sputtering at different Ar flow rates (3 to 7 sccm). The effect of Ar flow rates on the structural, morphology, and electrical properties of the WS2 thin films was investigated...
Saved in:
Main Authors: | Akhtaruzzaman M., Shahiduzzaman M., Amin N., Muhammad G., Islam M.A., Sobayel Bin Rafiq K., Sopian K. |
---|---|
Other Authors: | 57195441001 |
Format: | Article |
Published: |
MDPI AG
2023
|
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Impact of ar flow rates on micro-structural properties of ws2 thin film by rf magnetron sputtering
by: Akhtaruzzaman, Md, et al.
Published: (2021) -
Structural properties of CdS thin-films deposited by RF magnetron sputtering
by: Ahamed E.M.K.I., et al.
Published: (2023) -
RF magnetron sputtered YSZ thin film: Fabrication and characterizations
by: Meskon, Shahrul Razi, et al.
Published: (2010) -
Effect of selective lateral chromium doping by rf magnetron sputtering on the structural, and opto-electrical properties of nickel oxide
by: Jamal M.S., et al.
Published: (2023) -
Electrical property of ITO thin film deposited by Rf Magnetron Sputtering
by: Sutjipto, Agus Geter Edy, et al.
Published: (2011)