Impact of ar flow rates on micro-structural properties of ws2 thin film by rf magnetron sputtering
Tungsten disulfide (WS2) thin films were deposited on soda-lime glass (SLG) substrates using radio frequency (RF) magnetron sputtering at different Ar flow rates (3 to 7 sccm). The effect of Ar flow rates on the structural, morphology, and electrical properties of the WS2 thin films was investigated...
Saved in:
| Main Authors: | , , , , , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Published: |
MDPI AG
2023
|
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Be the first to leave a comment!