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Effect of alignment mark architecture on alignment signal behavior in advanced lithography

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Main Authors: Normah, Ahmad, Uda, Hashim, Mohd Jeffery, Manaf, Kader Ibrahim, Abdul Wahab
Format: Article
Language:English
Published: Universiti Malaya 2009
Subjects:
Alignment mark
Alignment signal
Lithography
Lithography > Technique
Metal mark
Deposition
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/6836
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spelling my.unimap-68362009-08-11T08:54:27Z Effect of alignment mark architecture on alignment signal behavior in advanced lithography Normah, Ahmad Uda, Hashim Mohd Jeffery, Manaf Kader Ibrahim, Abdul Wahab Alignment mark Alignment signal Lithography Lithography -- Technique Metal mark Deposition Link to publisher's homepage at http://ejum.fsktm.um.edu.my Alignment mark architecture is divided into two types, which depending on where the mark is defined. Alignment mark that is defined through the contact masking steps is known as contact mark and alignment mark that is defined through metal masking steps is known as metal mark. Due to the difference between processing steps for these two layers, alignment mark characteristics exhibits a different nature. Metal mark deformation is not as severe as contact mark since metal mark formation only involved two processing steps, which is etching, and deposition steps. Hence, it is expected that the alignment signal behavior for this two mark type will be different. AH32, AH53, and AH74 metal and contact alignment mark was evaluated. Based from the results, AH32 mark shows a significant trend difference between contact and metal mark. This is due to the fact AH32 contact mark is the easiest to be deformed since its feature size is the biggest compared to AH53 and AH74. AH53 and AH74 alignment signal performance between contact and metal mark are comparable. 2009-08-11T08:53:52Z 2009-08-11T08:53:52Z 2007 Article International Journal of Mechanical and Materials Engineering, vol.2 (1), 2007, pages 8-18. 1823-0334 http://ejum.fsktm.um.edu.my/VolumeListing.aspx?JournalID=19 http://hdl.handle.net/123456789/6836 en Universiti Malaya
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Alignment mark
Alignment signal
Lithography
Lithography -- Technique
Metal mark
Deposition
spellingShingle Alignment mark
Alignment signal
Lithography
Lithography -- Technique
Metal mark
Deposition
Normah, Ahmad
Uda, Hashim
Mohd Jeffery, Manaf
Kader Ibrahim, Abdul Wahab
Effect of alignment mark architecture on alignment signal behavior in advanced lithography
description Link to publisher's homepage at http://ejum.fsktm.um.edu.my
format Article
author Normah, Ahmad
Uda, Hashim
Mohd Jeffery, Manaf
Kader Ibrahim, Abdul Wahab
author_facet Normah, Ahmad
Uda, Hashim
Mohd Jeffery, Manaf
Kader Ibrahim, Abdul Wahab
author_sort Normah, Ahmad
title Effect of alignment mark architecture on alignment signal behavior in advanced lithography
title_short Effect of alignment mark architecture on alignment signal behavior in advanced lithography
title_full Effect of alignment mark architecture on alignment signal behavior in advanced lithography
title_fullStr Effect of alignment mark architecture on alignment signal behavior in advanced lithography
title_full_unstemmed Effect of alignment mark architecture on alignment signal behavior in advanced lithography
title_sort effect of alignment mark architecture on alignment signal behavior in advanced lithography
publisher Universiti Malaya
publishDate 2009
url http://dspace.unimap.edu.my/xmlui/handle/123456789/6836
_version_ 1643788580215062528
score 13.222552

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