Holdings: Alignment mark architecture effect on alignment signal behavior in advanced lithography

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Bibliographic Details
Main Authors:	Normah, Ahmad, Uda, Hashim, Mohd Jeffrey, Manaf, Kader Ibrahim, Abdul Wahab
Format:	Article
Language:	English
Published:	Institute of Electrical and Electronics Engineering (IEEE) 2009
Subjects:	Alignment mark Alignment signal Lithography CMOS integrated circuits Metal oxide semiconductors, Complementary Scanner alignment system
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/6676
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