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Alignment mark architecture effect on alignment signal behavior in advanced lithography

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Main Authors: Normah, Ahmad, Uda, Hashim, Mohd Jeffrey, Manaf, Kader Ibrahim, Abdul Wahab
Format: Article
Language:English
Published: Institute of Electrical and Electronics Engineering (IEEE) 2009
Subjects:
Alignment mark
Alignment signal
Lithography
CMOS integrated circuits
Metal oxide semiconductors, Complementary
Scanner alignment system
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/6676
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spelling my.unimap-66762010-11-23T06:03:33Z Alignment mark architecture effect on alignment signal behavior in advanced lithography Normah, Ahmad Uda, Hashim Mohd Jeffrey, Manaf Kader Ibrahim, Abdul Wahab Alignment mark Alignment signal Lithography CMOS integrated circuits Metal oxide semiconductors, Complementary Scanner alignment system Link to publisher's homepage at http://ieeexplore.ieee.org The downscaling of CMOS technology becomes a challenge to the scanner alignment system since overlay and alignment accuracy becomes tighter. Such a tight overlay requirement requires a very stable alignment performance. A stable alignment performance is indicates by a stable alignment signal generation. Hence, it is important to perform process characterization in order to choose an alignment mark, which generates the most stable signals. Different alignment mark type may show a different behavior in signal generation. In this paper, the signals behavior will be explored by experimenting using two different alignment mark architecture. This architecture can be further divided into three, which is AH32, AH53, and AH74. Based from the results, AH32 mark shows a significant trend difference between contact and metal mark. This is due to the fact AH32 contact mark is the easiest to be deformed since its feature size is the biggest compared to AH53 and AH74. AH53 and AH74 alignment signal performance between contact and metal mark are comparable. 2009-08-05T09:00:22Z 2009-08-05T09:00:22Z 2006 Article p.732-739 0-7803-9730-4 http://ieeexplore.ieee.org/xpls/abs_all.jsp?=&arnumber=4266715 http://hdl.handle.net/123456789/6676 en Proceedings of IEEE International Conference on Semiconductor Electronics (ICSE 2006) Institute of Electrical and Electronics Engineering (IEEE)
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Alignment mark
Alignment signal
Lithography
CMOS integrated circuits
Metal oxide semiconductors, Complementary
Scanner alignment system
spellingShingle Alignment mark
Alignment signal
Lithography
CMOS integrated circuits
Metal oxide semiconductors, Complementary
Scanner alignment system
Normah, Ahmad
Uda, Hashim
Mohd Jeffrey, Manaf
Kader Ibrahim, Abdul Wahab
Alignment mark architecture effect on alignment signal behavior in advanced lithography
description Link to publisher's homepage at http://ieeexplore.ieee.org
format Article
author Normah, Ahmad
Uda, Hashim
Mohd Jeffrey, Manaf
Kader Ibrahim, Abdul Wahab
author_facet Normah, Ahmad
Uda, Hashim
Mohd Jeffrey, Manaf
Kader Ibrahim, Abdul Wahab
author_sort Normah, Ahmad
title Alignment mark architecture effect on alignment signal behavior in advanced lithography
title_short Alignment mark architecture effect on alignment signal behavior in advanced lithography
title_full Alignment mark architecture effect on alignment signal behavior in advanced lithography
title_fullStr Alignment mark architecture effect on alignment signal behavior in advanced lithography
title_full_unstemmed Alignment mark architecture effect on alignment signal behavior in advanced lithography
title_sort alignment mark architecture effect on alignment signal behavior in advanced lithography
publisher Institute of Electrical and Electronics Engineering (IEEE)
publishDate 2009
url http://dspace.unimap.edu.my/xmlui/handle/123456789/6676
_version_ 1643788575643271168
score 13.222552

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