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Alignment mark architecture effect on alignment signal behavior in advanced lithography

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Bibliographic Details
Main Authors: Normah, Ahmad, Uda, Hashim, Mohd Jeffrey, Manaf, Kader Ibrahim, Abdul Wahab
Format: Article
Language:English
Published: Institute of Electrical and Electronics Engineering (IEEE) 2009
Subjects:
Alignment mark
Alignment signal
Lithography
CMOS integrated circuits
Metal oxide semiconductors, Complementary
Scanner alignment system
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/6676
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