Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams

Hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by radio-frequency plasma enhanced chemical vapour deposition was irradiated by an energetic ion beam source from a 3.3 kJ Mather type dense plasma focus device. The effects of the energetic ion beam irradiations on the structural a...

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Bibliographic Details
Main Authors: Goh, Boon Tong, Ngoi, Siew Kien, Yap, S.L., Wong, C.S., Dee, Chang Fu, Rahman, Saadah Abdul
Format: Article
Published: 2013
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Online Access:http://eprints.um.edu.my/7377/
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