Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams

Hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by radio-frequency plasma enhanced chemical vapour deposition was irradiated by an energetic ion beam source from a 3.3 kJ Mather type dense plasma focus device. The effects of the energetic ion beam irradiations on the structural a...

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Main Authors: Goh, Boon Tong, Ngoi, Siew Kien, Yap, S.L., Wong, C.S., Dee, Chang Fu, Rahman, Saadah Abdul
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Published: 2013
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Online Access:http://eprints.um.edu.my/7377/
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spelling my.um.eprints.73772014-12-12T02:12:52Z http://eprints.um.edu.my/7377/ Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams Goh, Boon Tong Ngoi, Siew Kien Yap, S.L. Wong, C.S. Dee, Chang Fu Rahman, Saadah Abdul QC Physics Hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by radio-frequency plasma enhanced chemical vapour deposition was irradiated by an energetic ion beam source from a 3.3 kJ Mather type dense plasma focus device. The effects of the energetic ion beam irradiations on the structural and optical properties of the nc-Si:H thin films have been studied. The results show that the formation of Si nano-crystallites embedded within the amorphous matrix was enhanced with an increase in the number of shots (up to 60) of irradiation. This significantly influences the optical properties of the films which include a widening of the optical band gap, a decrease in structure disorder and exhibiting a wide range of photoluminescence (PL) emission spectra at room temperature. Correlations of the PL peak energy and intensity with the optical energy gap, crystalline volume fraction, silicon suboxide content and its relationship to the oxide defects in the variation of number of shots are also discussed. 2013 Article PeerReviewed Goh, Boon Tong and Ngoi, Siew Kien and Yap, S.L. and Wong, C.S. and Dee, Chang Fu and Rahman, Saadah Abdul (2013) Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams. Journal of Non-Crystalline Solids, 363. pp. 13-19. ISSN 0022-3093 10.1016/j.jnoncrysol.2012.12.005
institution Universiti Malaya
building UM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaya
content_source UM Research Repository
url_provider http://eprints.um.edu.my/
topic QC Physics
spellingShingle QC Physics
Goh, Boon Tong
Ngoi, Siew Kien
Yap, S.L.
Wong, C.S.
Dee, Chang Fu
Rahman, Saadah Abdul
Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams
description Hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by radio-frequency plasma enhanced chemical vapour deposition was irradiated by an energetic ion beam source from a 3.3 kJ Mather type dense plasma focus device. The effects of the energetic ion beam irradiations on the structural and optical properties of the nc-Si:H thin films have been studied. The results show that the formation of Si nano-crystallites embedded within the amorphous matrix was enhanced with an increase in the number of shots (up to 60) of irradiation. This significantly influences the optical properties of the films which include a widening of the optical band gap, a decrease in structure disorder and exhibiting a wide range of photoluminescence (PL) emission spectra at room temperature. Correlations of the PL peak energy and intensity with the optical energy gap, crystalline volume fraction, silicon suboxide content and its relationship to the oxide defects in the variation of number of shots are also discussed.
format Article
author Goh, Boon Tong
Ngoi, Siew Kien
Yap, S.L.
Wong, C.S.
Dee, Chang Fu
Rahman, Saadah Abdul
author_facet Goh, Boon Tong
Ngoi, Siew Kien
Yap, S.L.
Wong, C.S.
Dee, Chang Fu
Rahman, Saadah Abdul
author_sort Goh, Boon Tong
title Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams
title_short Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams
title_full Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams
title_fullStr Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams
title_full_unstemmed Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams
title_sort structural and optical properties of the nc-si:h thin films irradiated by high energetic ion beams
publishDate 2013
url http://eprints.um.edu.my/7377/
_version_ 1643688029293903872
score 13.222552