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Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films

In this investigation, TiO2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 degrees C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO2 films were characterized by x-ray diffraction...

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Main Authors: Hasan, M.M., Haseeb, A.S. Md. Abdul, Masjuki, Haji Hassan, Saidur, R., Hamdi, M.
Format: Article
Published: 2010
Subjects:
TA Engineering (General). Civil engineering (General)
Online Access:http://eprints.um.edu.my/5744/
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spelling my.um.eprints.57442018-10-17T01:06:08Z http://eprints.um.edu.my/5744/ Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films Hasan, M.M. Haseeb, A.S. Md. Abdul Masjuki, Haji Hassan Saidur, R. Hamdi, M. TA Engineering (General). Civil engineering (General) In this investigation, TiO2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 degrees C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO2 films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), field emission Auger electron microscopy (FEAES), and UV-visible-NIR spectrophotometry. The XRD results reveal that all the as-deposited films possessing the anatase structure and crystallinity of TiO2 films appears to deteriorate slightly at higher substrate temperatures. The crystallite size of the as-deposited films at different substrate temperatures is similar to 44 nm, which shows insignificant variation. AFM images exhibit a similar type of nodular morphology in the as-grown films. TiO2 films deposited at different substrate temperatures exhibit high visible transmittance and a high refractive index ranging from 2.31 to 2.37 at a wavelength of 550 nm. The optical band gap of the films has been estimated to be in the range from 3.39 to 3.42 eV. 2010 Article PeerReviewed Hasan, M.M. and Haseeb, A.S. Md. Abdul and Masjuki, Haji Hassan and Saidur, R. and Hamdi, M. (2010) Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films. Arabian Journal for Science and Engineering, 35 (1C). pp. 147-156. ISSN 1319-8025
institution Universiti Malaya
building UM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaya
content_source UM Research Repository
url_provider http://eprints.um.edu.my/
topic TA Engineering (General). Civil engineering (General)
spellingShingle TA Engineering (General). Civil engineering (General)
Hasan, M.M.
Haseeb, A.S. Md. Abdul
Masjuki, Haji Hassan
Saidur, R.
Hamdi, M.
Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films
description In this investigation, TiO2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 degrees C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO2 films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), field emission Auger electron microscopy (FEAES), and UV-visible-NIR spectrophotometry. The XRD results reveal that all the as-deposited films possessing the anatase structure and crystallinity of TiO2 films appears to deteriorate slightly at higher substrate temperatures. The crystallite size of the as-deposited films at different substrate temperatures is similar to 44 nm, which shows insignificant variation. AFM images exhibit a similar type of nodular morphology in the as-grown films. TiO2 films deposited at different substrate temperatures exhibit high visible transmittance and a high refractive index ranging from 2.31 to 2.37 at a wavelength of 550 nm. The optical band gap of the films has been estimated to be in the range from 3.39 to 3.42 eV.
format Article
author Hasan, M.M.
Haseeb, A.S. Md. Abdul
Masjuki, Haji Hassan
Saidur, R.
Hamdi, M.
author_facet Hasan, M.M.
Haseeb, A.S. Md. Abdul
Masjuki, Haji Hassan
Saidur, R.
Hamdi, M.
author_sort Hasan, M.M.
title Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films
title_short Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films
title_full Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films
title_fullStr Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films
title_full_unstemmed Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films
title_sort influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase tio2 films
publishDate 2010
url http://eprints.um.edu.my/5744/
_version_ 1643687656870117376
score 13.244199

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