Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films
In this investigation, TiO2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 degrees C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO2 films were characterized by x-ray diffraction...
Saved in:
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Published: |
2010
|
| Subjects: | |
| Online Access: | http://eprints.um.edu.my/5744/ |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | In this investigation, TiO2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 degrees C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO2 films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), field emission Auger electron microscopy (FEAES), and UV-visible-NIR spectrophotometry. The XRD results reveal that all the as-deposited films possessing the anatase structure and crystallinity of TiO2 films appears to deteriorate slightly at higher substrate temperatures. The crystallite size of the as-deposited films at different substrate temperatures is similar to 44 nm, which shows insignificant variation. AFM images exhibit a similar type of nodular morphology in the as-grown films. TiO2 films deposited at different substrate temperatures exhibit high visible transmittance and a high refractive index ranging from 2.31 to 2.37 at a wavelength of 550 nm. The optical band gap of the films has been estimated to be in the range from 3.39 to 3.42 eV. |
|---|