Microstructural and optical properties of ZrON/Si thin films
ZrON/Si(100) layer structure formation has been produced by oxidation/nitridation of sputtered Zr metal in N2O/Ar ambient at 500–900 °C. Micromorphology and structural properties of the films have been evaluated by scanning electron microscopy, atomic force microscopy, and reflection high-energy ele...
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| Main Authors: | , , , |
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| Format: | Article |
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Elsevier
2013
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/13006/ http://www.sciencedirect.com/science/article/pii/S0167577X13004291 http://dx.doi.org/10.1016/j.matlet.2013.03.100 |
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| Summary: | ZrON/Si(100) layer structure formation has been produced by oxidation/nitridation of sputtered Zr metal in N2O/Ar ambient at 500–900 °C. Micromorphology and structural properties of the films have been evaluated by scanning electron microscopy, atomic force microscopy, and reflection high-energy electron diffraction. Dispersive optical properties of the ZrON/Si reflection system have been studied with spectroscopic ellipsometry. A drastic increase of SiO2-based interface layer thickness has been found at 700–900 °C. |
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