Characterization and fabrication of 90nm PMOS with strained silicon using TCAD silvaco / Mohd Ariff Ab Hamid
This paper is looking into the enhancement of conventional 90nm PMOS by using graded silicon germanium layer (SiGe) within the channel and bulk of semiconductor.The performance of conventional 90nm PMOS and 90nm PMOS with silicon germanium layer was compared. A process simulation of Strained Silicon...
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| Format: | Thesis |
| Language: | English |
| Published: |
2009
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| Online Access: | https://ir.uitm.edu.my/id/eprint/98852/1/98852.pdf https://ir.uitm.edu.my/id/eprint/98852/ |
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