Surface roughness of FIB sputtered silicon
Mathematical models are developed to calculate the surface roughness of focused-ion-beam (FIB) sputtered surface. The surface roughness is the combination of the beam function and the material function. The beam function includes ion type, acceleration voltage, ion flux, intensity distribution,...
Saved in:
| Main Authors: | , , |
|---|---|
| 其他作者: | |
| 格式: | Conference or Workshop Item |
| 語言: | English |
| 出版: |
Kluwer Academic Publishers (Springer)
2001
|
| 主題: | |
| 在線閱讀: | http://irep.iium.edu.my/28903/1/surface_of_roughness.pdf http://irep.iium.edu.my/28903/ |
| 標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
| 總結: | Mathematical models are developed to calculate the surface roughness
of focused-ion-beam (FIB) sputtered surface. The surface roughness is the
combination of the beam function and the material function. The beam
function includes ion type, acceleration voltage, ion flux, intensity
distribution, dwell time, etc; the material function includes the inherent
material properties related to FIB micromachining. Surface of FIB sputtered
(100) silicon was characterized using atomic force microscope. Reasonable
agreement between the calculated and measured surface roughness was
found. |
|---|