Surface roughness of FIB sputtered silicon
Mathematical models are developed to calculate the surface roughness of focused-ion-beam (FIB) sputtered surface. The surface roughness is the combination of the beam function and the material function. The beam function includes ion type, acceleration voltage, ion flux, intensity distribution,...
محفوظ في:
| المؤلفون الرئيسيون: | , , |
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| مؤلفون آخرون: | |
| التنسيق: | Conference or Workshop Item |
| اللغة: | English |
| منشور في: |
Kluwer Academic Publishers (Springer)
2001
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://irep.iium.edu.my/28903/1/surface_of_roughness.pdf http://irep.iium.edu.my/28903/ |
| الوسوم: |
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| الملخص: | Mathematical models are developed to calculate the surface roughness
of focused-ion-beam (FIB) sputtered surface. The surface roughness is the
combination of the beam function and the material function. The beam
function includes ion type, acceleration voltage, ion flux, intensity
distribution, dwell time, etc; the material function includes the inherent
material properties related to FIB micromachining. Surface of FIB sputtered
(100) silicon was characterized using atomic force microscope. Reasonable
agreement between the calculated and measured surface roughness was
found. |
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