Fabrication of silicon nanopillar sheet for Cell Culture Dish
This paper discusses the fabrication of nanopillars using focused ion beam (FIB) sputtering. A 25 keV Ga+ FIB was used to machine the nanopillars. A reversed bitmap method was used to fabricate nanopillars where it milled the substrate all over except the nanopillar area. The height of the nanopilla...
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| 主要な著者: | , |
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| フォーマット: | 論文 |
| 言語: | English |
| 出版事項: |
Trans Tech Publications, Switzerland
2011
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| 主題: | |
| オンライン･アクセス: | http://irep.iium.edu.my/2281/1/AMR_2011_Vol_264-265__1352-1356.pdf http://irep.iium.edu.my/2281/ http://www.scientific.net |
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