Fabrication of silicon nanopillar sheet for Cell Culture Dish

This paper discusses the fabrication of nanopillars using focused ion beam (FIB) sputtering. A 25 keV Ga+ FIB was used to machine the nanopillars. A reversed bitmap method was used to fabricate nanopillars where it milled the substrate all over except the nanopillar area. The height of the nanopilla...

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Main Authors: Ali, Mohammad Yeakub, Mohd Fuad, Nurul Hajar
Format: Article
Language:English
Published: Trans Tech Publications, Switzerland 2011
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Online Access:http://irep.iium.edu.my/2281/1/AMR_2011_Vol_264-265__1352-1356.pdf
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spelling my.iium.irep.22812013-06-27T07:35:20Z http://irep.iium.edu.my/2281/ Fabrication of silicon nanopillar sheet for Cell Culture Dish Ali, Mohammad Yeakub Mohd Fuad, Nurul Hajar TJ Mechanical engineering and machinery TS Manufactures This paper discusses the fabrication of nanopillars using focused ion beam (FIB) sputtering. A 25 keV Ga+ FIB was used to machine the nanopillars. A reversed bitmap method was used to fabricate nanopillars where it milled the substrate all over except the nanopillar area. The height of the nanopillars ranges from 1 to 5.5 μm with aspect ratio of 1-6. Empirical relationship of taper angle, aspect ratio and height of the nanopillar were established. Taper angle was found to be reduced as the height of the nanopillar increased. The taper angle of nanopillars depends on the acceleration voltage, probe current and dwell time. Trans Tech Publications, Switzerland 2011-06-30 Article REM application/pdf en http://irep.iium.edu.my/2281/1/AMR_2011_Vol_264-265__1352-1356.pdf Ali, Mohammad Yeakub and Mohd Fuad, Nurul Hajar (2011) Fabrication of silicon nanopillar sheet for Cell Culture Dish. Advanced Materials Research, 264. pp. 1352-1356. ISSN 1022-6680 http://www.scientific.net doi:10.4028/www.scientific.net/AMR.264-265.1352
institution Universiti Islam Antarabangsa Malaysia
building IIUM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider International Islamic University Malaysia
content_source IIUM Repository (IREP)
url_provider http://irep.iium.edu.my/
language English
topic TJ Mechanical engineering and machinery
TS Manufactures
spellingShingle TJ Mechanical engineering and machinery
TS Manufactures
Ali, Mohammad Yeakub
Mohd Fuad, Nurul Hajar
Fabrication of silicon nanopillar sheet for Cell Culture Dish
description This paper discusses the fabrication of nanopillars using focused ion beam (FIB) sputtering. A 25 keV Ga+ FIB was used to machine the nanopillars. A reversed bitmap method was used to fabricate nanopillars where it milled the substrate all over except the nanopillar area. The height of the nanopillars ranges from 1 to 5.5 μm with aspect ratio of 1-6. Empirical relationship of taper angle, aspect ratio and height of the nanopillar were established. Taper angle was found to be reduced as the height of the nanopillar increased. The taper angle of nanopillars depends on the acceleration voltage, probe current and dwell time.
format Article
author Ali, Mohammad Yeakub
Mohd Fuad, Nurul Hajar
author_facet Ali, Mohammad Yeakub
Mohd Fuad, Nurul Hajar
author_sort Ali, Mohammad Yeakub
title Fabrication of silicon nanopillar sheet for Cell Culture Dish
title_short Fabrication of silicon nanopillar sheet for Cell Culture Dish
title_full Fabrication of silicon nanopillar sheet for Cell Culture Dish
title_fullStr Fabrication of silicon nanopillar sheet for Cell Culture Dish
title_full_unstemmed Fabrication of silicon nanopillar sheet for Cell Culture Dish
title_sort fabrication of silicon nanopillar sheet for cell culture dish
publisher Trans Tech Publications, Switzerland
publishDate 2011
url http://irep.iium.edu.my/2281/1/AMR_2011_Vol_264-265__1352-1356.pdf
http://irep.iium.edu.my/2281/
http://www.scientific.net
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score 13.211869