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Controlled defect on multilayer graphene surface by oxygen plasma

The study pertaining defect fabrication of graphene has gained interest nowadays. To date, the fabrication of the defect using reactive ion etching on the oxygen flow rate has not been adequately studied. In this work, fabrication defect on multilayer graphene using reactive ion etching at 30 sccm a...

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Main Authors: Morsin, Marriatyi, Isaak, Suhaila, Morsin, Marlia, Yusof, Yusmeeraz
Format: Conference or Workshop Item
Language:English
Published: 2017
Subjects:
TK Electrical engineering. Electronics Nuclear engineering
Online Access:http://eprints.utm.my/id/eprint/97020/1/SuhailaIsaak2017_ControlledDefectOnMultilayerGrapheneSurface.pdf
http://eprints.utm.my/id/eprint/97020/
http://dx.doi.org/10.1063/1.4968370
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spelling my.utm.970202022-09-13T07:02:14Z http://eprints.utm.my/id/eprint/97020/ Controlled defect on multilayer graphene surface by oxygen plasma Morsin, Marriatyi Isaak, Suhaila Morsin, Marlia Yusof, Yusmeeraz TK Electrical engineering. Electronics Nuclear engineering The study pertaining defect fabrication of graphene has gained interest nowadays. To date, the fabrication of the defect using reactive ion etching on the oxygen flow rate has not been adequately studied. In this work, fabrication defect on multilayer graphene using reactive ion etching at 30 sccm and 50 sccm oxygen flow rates as a controlled parameter. The other parameters such as pressure, exposure time and power are set as well. The resistance of the exposed multilayer graphene devices at 30 sccm and 50 sccm are respectively 38 and 49 times higher than the non-exposed device. The increased oxygen flow rate in the reactive ion etching deteriorates the crystalline quality of the multilayer graphene thus declines its function as a device. It is suggested that only low oxygen flow rate is to be used to fabricate small amount of defect for the controlled defect purposes. 2017 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.utm.my/id/eprint/97020/1/SuhailaIsaak2017_ControlledDefectOnMultilayerGrapheneSurface.pdf Morsin, Marriatyi and Isaak, Suhaila and Morsin, Marlia and Yusof, Yusmeeraz (2017) Controlled defect on multilayer graphene surface by oxygen plasma. In: 1st International Conference on Engineering, Science and Nanotechnology 2016, ICESNANO 2016, 3 - 5 August 2016, Solo, Indonesia. http://dx.doi.org/10.1063/1.4968370
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
language English
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Morsin, Marriatyi
Isaak, Suhaila
Morsin, Marlia
Yusof, Yusmeeraz
Controlled defect on multilayer graphene surface by oxygen plasma
description The study pertaining defect fabrication of graphene has gained interest nowadays. To date, the fabrication of the defect using reactive ion etching on the oxygen flow rate has not been adequately studied. In this work, fabrication defect on multilayer graphene using reactive ion etching at 30 sccm and 50 sccm oxygen flow rates as a controlled parameter. The other parameters such as pressure, exposure time and power are set as well. The resistance of the exposed multilayer graphene devices at 30 sccm and 50 sccm are respectively 38 and 49 times higher than the non-exposed device. The increased oxygen flow rate in the reactive ion etching deteriorates the crystalline quality of the multilayer graphene thus declines its function as a device. It is suggested that only low oxygen flow rate is to be used to fabricate small amount of defect for the controlled defect purposes.
format Conference or Workshop Item
author Morsin, Marriatyi
Isaak, Suhaila
Morsin, Marlia
Yusof, Yusmeeraz
author_facet Morsin, Marriatyi
Isaak, Suhaila
Morsin, Marlia
Yusof, Yusmeeraz
author_sort Morsin, Marriatyi
title Controlled defect on multilayer graphene surface by oxygen plasma
title_short Controlled defect on multilayer graphene surface by oxygen plasma
title_full Controlled defect on multilayer graphene surface by oxygen plasma
title_fullStr Controlled defect on multilayer graphene surface by oxygen plasma
title_full_unstemmed Controlled defect on multilayer graphene surface by oxygen plasma
title_sort controlled defect on multilayer graphene surface by oxygen plasma
publishDate 2017
url http://eprints.utm.my/id/eprint/97020/1/SuhailaIsaak2017_ControlledDefectOnMultilayerGrapheneSurface.pdf
http://eprints.utm.my/id/eprint/97020/
http://dx.doi.org/10.1063/1.4968370
_version_ 1744353703116144640
score 13.211869

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