Cover Image

The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application

We report the effect of depth on fabrication of nanopore on silicon substrate by utilizing one-step focused ion beam (FIB) milling. The conical shaped of nanopores were successfully fabricated by optimizing the milling parameters of FIB system. The milling depth, base diameter and tip diameter of th...

Full description

Saved in:
Bibliographic Details
Main Authors: Sabili, Sufi Nazihah, Yahaya, Hafizal, Ahmad, Fauzan
Format: Conference or Workshop Item
Published: 2020
Subjects:
T Technology (General)
Online Access:http://eprints.utm.my/id/eprint/92244/
http://dx.doi.org/10.1109/ICSE49846.2020.9166877
Tags: Add Tag
No Tags, Be the first to tag this record!
id my.utm.92244
record_format eprints
spelling my.utm.922442021-09-28T07:34:37Z http://eprints.utm.my/id/eprint/92244/ The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application Sabili, Sufi Nazihah Yahaya, Hafizal Ahmad, Fauzan T Technology (General) We report the effect of depth on fabrication of nanopore on silicon substrate by utilizing one-step focused ion beam (FIB) milling. The conical shaped of nanopores were successfully fabricated by optimizing the milling parameters of FIB system. The milling depth, base diameter and tip diameter of the resulting nanopores were characterized using field emission scanning electron microscope (FESEM). The minimum diameter of the conical shaped nanopore was found to be 66.51 nm. Moreover, when aspect ratio is less than unity, the redeposited material will land on the tip of the nanopores and adhere at the sidewall for high aspect ratio. This result will be beneficial towards the new generation of nanopore-based DNA sequencing. 2020 Conference or Workshop Item PeerReviewed Sabili, Sufi Nazihah and Yahaya, Hafizal and Ahmad, Fauzan (2020) The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application. In: 14th IEEE International Conference on Semiconductor Electronics, ICSE2020, 28 - 29 July 2020, Kuala Lumpur, Malaysia. http://dx.doi.org/10.1109/ICSE49846.2020.9166877
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic T Technology (General)
spellingShingle T Technology (General)
Sabili, Sufi Nazihah
Yahaya, Hafizal
Ahmad, Fauzan
The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application
description We report the effect of depth on fabrication of nanopore on silicon substrate by utilizing one-step focused ion beam (FIB) milling. The conical shaped of nanopores were successfully fabricated by optimizing the milling parameters of FIB system. The milling depth, base diameter and tip diameter of the resulting nanopores were characterized using field emission scanning electron microscope (FESEM). The minimum diameter of the conical shaped nanopore was found to be 66.51 nm. Moreover, when aspect ratio is less than unity, the redeposited material will land on the tip of the nanopores and adhere at the sidewall for high aspect ratio. This result will be beneficial towards the new generation of nanopore-based DNA sequencing.
format Conference or Workshop Item
author Sabili, Sufi Nazihah
Yahaya, Hafizal
Ahmad, Fauzan
author_facet Sabili, Sufi Nazihah
Yahaya, Hafizal
Ahmad, Fauzan
author_sort Sabili, Sufi Nazihah
title The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application
title_short The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application
title_full The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application
title_fullStr The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application
title_full_unstemmed The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application
title_sort effect of depth on fabrication of nanopore using one-step focused ion beam milling for dna sequencing application
publishDate 2020
url http://eprints.utm.my/id/eprint/92244/
http://dx.doi.org/10.1109/ICSE49846.2020.9166877
_version_ 1712285069161267200
score 13.244367

Similar Items