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A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon

Effects of plasma power density and gas density on structural properties of nanocrystalline silicon grown by Plasma Enhanced Chemical Vapor Deposition (PECVD)are discussed in this paper. It has been found that both gas flow rates and plasma power density have an opposite effect on the film’s cryst...

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Main Authors: Tarjudin, Nurul Aini, Sumpono, Imam, Sakrani, Samsudi
Format: Book Section
Published: Faculty of Science, Universiti Teknologi Malaysia 2009
Online Access:http://eprints.utm.my/id/eprint/9031/
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spelling my.utm.90312017-09-14T06:37:24Z http://eprints.utm.my/id/eprint/9031/ A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon Tarjudin, Nurul Aini Sumpono, Imam Sakrani, Samsudi Effects of plasma power density and gas density on structural properties of nanocrystalline silicon grown by Plasma Enhanced Chemical Vapor Deposition (PECVD)are discussed in this paper. It has been found that both gas flow rates and plasma power density have an opposite effect on the film’s crystallinity. It was observed that higher plasma power density tend to increase the degree of crystallinity, while higher gas flow rates appeared to decrease its curves. It was also observed that microstructural defects were lower for samples with lower crystallinity. Faculty of Science, Universiti Teknologi Malaysia 2009-05 Book Section PeerReviewed Tarjudin, Nurul Aini and Sumpono, Imam and Sakrani, Samsudi (2009) A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon. In: Proceedings of Second International Conference and Workshops on Basic and Applied Sciences & Regional Annual Fundamental Science Seminar 2009. Faculty of Science, Universiti Teknologi Malaysia. ISBN 978‐983‐9805‐74‐1
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
description Effects of plasma power density and gas density on structural properties of nanocrystalline silicon grown by Plasma Enhanced Chemical Vapor Deposition (PECVD)are discussed in this paper. It has been found that both gas flow rates and plasma power density have an opposite effect on the film’s crystallinity. It was observed that higher plasma power density tend to increase the degree of crystallinity, while higher gas flow rates appeared to decrease its curves. It was also observed that microstructural defects were lower for samples with lower crystallinity.
format Book Section
author Tarjudin, Nurul Aini
Sumpono, Imam
Sakrani, Samsudi
spellingShingle Tarjudin, Nurul Aini
Sumpono, Imam
Sakrani, Samsudi
A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
author_facet Tarjudin, Nurul Aini
Sumpono, Imam
Sakrani, Samsudi
author_sort Tarjudin, Nurul Aini
title A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
title_short A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
title_full A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
title_fullStr A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
title_full_unstemmed A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
title_sort review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
publisher Faculty of Science, Universiti Teknologi Malaysia
publishDate 2009
url http://eprints.utm.my/id/eprint/9031/
_version_ 1643645100930105344
score 13.211869

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