A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
Effects of plasma power density and gas density on structural properties of nanocrystalline silicon grown by Plasma Enhanced Chemical Vapor Deposition (PECVD)are discussed in this paper. It has been found that both gas flow rates and plasma power density have an opposite effect on the film’s cryst...
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| Main Authors: | , , |
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| Format: | Book Section |
| Published: |
Faculty of Science, Universiti Teknologi Malaysia
2009
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| Online Access: | http://eprints.utm.my/id/eprint/9031/ |
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