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Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique

Titanium nitride (TiN) films were deposited on high-speed steel (HSS) using cathodic arc physical vapor deposition (CAPVD) technique. The effect of substrate bias on the crystallography, microstructure, deposition rate, coating thickness and composition, hardness, and adhesion strength of TiN films...

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Main Authors: Ali, Mubarak, Hamzah, Esah, Mohd Toff, Mohd Radzi
Format: Article
Published: World Scientific 2006
Subjects:
QC Physics
Online Access:http://eprints.utm.my/id/eprint/7694/
http://dx.doi.org/10.1142/S0218625X0600858X
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spelling my.utm.76942009-01-14T02:52:05Z http://eprints.utm.my/id/eprint/7694/ Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique Ali, Mubarak Hamzah, Esah Mohd Toff, Mohd Radzi QC Physics Titanium nitride (TiN) films were deposited on high-speed steel (HSS) using cathodic arc physical vapor deposition (CAPVD) technique. The effect of substrate bias on the crystallography, microstructure, deposition rate, coating thickness and composition, hardness, and adhesion strength of TiN films was investigated. The crystallography of the films was investigated using X-ray diffraction with glazing incidence angle technique. The coating microstructure and elemental composition analysis were carried out using field emission scanning electron microscopy (FE-SEM) together with energy-dispersive X-ray. Crystallography of the films revealed that the effect of substrate bias shows complex symmetry in crystal structure. The resputtering effect due to the high-energy ion bombardment on the film surface influenced the thickness as well as the color of deposited coatings. By increasing the substrate bias from 0 to - 150 V, the size and amount of macrodroplets decreased, whereas the micro-Vickers hardness decreased from 2530 HV0.05 to 1500 HV0.05. Scratch tester used to compare the critical loads for coatings and the adhesion achievable at substrate bias of - 50 V was demonstrated, with relevance to the various modes. World Scientific 2006-10 Article PeerReviewed Ali, Mubarak and Hamzah, Esah and Mohd Toff, Mohd Radzi (2006) Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique. Surface Review and Letters, 13 (5). pp. 621-633. ISSN 0218-625X http://dx.doi.org/10.1142/S0218625X0600858X 10.1142/S0218625X0600858X
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic QC Physics
spellingShingle QC Physics
Ali, Mubarak
Hamzah, Esah
Mohd Toff, Mohd Radzi
Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique
description Titanium nitride (TiN) films were deposited on high-speed steel (HSS) using cathodic arc physical vapor deposition (CAPVD) technique. The effect of substrate bias on the crystallography, microstructure, deposition rate, coating thickness and composition, hardness, and adhesion strength of TiN films was investigated. The crystallography of the films was investigated using X-ray diffraction with glazing incidence angle technique. The coating microstructure and elemental composition analysis were carried out using field emission scanning electron microscopy (FE-SEM) together with energy-dispersive X-ray. Crystallography of the films revealed that the effect of substrate bias shows complex symmetry in crystal structure. The resputtering effect due to the high-energy ion bombardment on the film surface influenced the thickness as well as the color of deposited coatings. By increasing the substrate bias from 0 to - 150 V, the size and amount of macrodroplets decreased, whereas the micro-Vickers hardness decreased from 2530 HV0.05 to 1500 HV0.05. Scratch tester used to compare the critical loads for coatings and the adhesion achievable at substrate bias of - 50 V was demonstrated, with relevance to the various modes.
format Article
author Ali, Mubarak
Hamzah, Esah
Mohd Toff, Mohd Radzi
author_facet Ali, Mubarak
Hamzah, Esah
Mohd Toff, Mohd Radzi
author_sort Ali, Mubarak
title Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique
title_short Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique
title_full Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique
title_fullStr Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique
title_full_unstemmed Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique
title_sort effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated hss synthesized by capvd technique
publisher World Scientific
publishDate 2006
url http://eprints.utm.my/id/eprint/7694/
http://dx.doi.org/10.1142/S0218625X0600858X
_version_ 1643644832508280832
score 13.211869

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