Effect of substrate bias voltage on the microstructural and mechanical properties of tin-coated HSS synthesized by capvd technique
Titanium nitride (TiN) films were deposited on high-speed steel (HSS) using cathodic arc physical vapor deposition (CAPVD) technique. The effect of substrate bias on the crystallography, microstructure, deposition rate, coating thickness and composition, hardness, and adhesion strength of TiN films...
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Format: | Article |
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World Scientific
2006
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Online Access: | http://eprints.utm.my/id/eprint/7694/ http://dx.doi.org/10.1142/S0218625X0600858X |
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