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The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)

"ALD is a precision growth technique that can deposit either amorphous or polycrystalline thin films on a variety of substrates. The difference in substrate can cause a variation in the ALD process, even it is carried out using the same reactants and deposition conditions [1]. TiO2 thin films...

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Main Authors: Hussin, Rosniza, Kwang, Leong Choy, Xianghui, Hou
Format: Article
Language:English
Published: Trans Tech Publications, Switzerland 2015
Subjects:
T Technology (General)
TA401-492 Materials of engineering and construction. Mechanics of materials
Online Access:http://eprints.uthm.edu.my/4878/1/AJ%202015%20%2844%29.pdf
http://eprints.uthm.edu.my/4878/
http://dx.doi.org/10.4028/www.scientific.net/AMR.1087.147
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spelling my.uthm.eprints.48782021-12-23T04:20:23Z http://eprints.uthm.edu.my/4878/ The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD) Hussin, Rosniza Kwang, Leong Choy Xianghui, Hou T Technology (General) TA401-492 Materials of engineering and construction. Mechanics of materials "ALD is a precision growth technique that can deposit either amorphous or polycrystalline thin films on a variety of substrates. The difference in substrate can cause a variation in the ALD process, even it is carried out using the same reactants and deposition conditions [1]. TiO2 thin films were grown using TTIP (Titanium isopropoxide) ALD on silicon wafers, glass slides, and stainless steel plates in order to study the effect of substrates on the growth of TiO2 with 3,000 deposition cycles, at 300oC.The thin films were analyzed using Xray Diffraction (XRD), Raman Spectroscopy, Atomic Force Microscope (AFM) and Spectroscopic Ellipsometer. The XRD analysis indicates that the main diffraction peak of (101) (2_= 25.3) could be indexed to anatase TiO2, regardless the types of substrates. The results show that crystalline TiO2 thin films could be grown easily on a crystal substrate rather than on an amorphous substrate." Trans Tech Publications, Switzerland 2015 Article PeerReviewed text en http://eprints.uthm.edu.my/4878/1/AJ%202015%20%2844%29.pdf Hussin, Rosniza and Kwang, Leong Choy and Xianghui, Hou (2015) The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD). Advanced Materials Research, 1087. pp. 147-151. ISSN 1022-6680 http://dx.doi.org/10.4028/www.scientific.net/AMR.1087.147
institution Universiti Tun Hussein Onn Malaysia
building UTHM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tun Hussein Onn Malaysia
content_source UTHM Institutional Repository
url_provider http://eprints.uthm.edu.my/
language English
topic T Technology (General)
TA401-492 Materials of engineering and construction. Mechanics of materials
spellingShingle T Technology (General)
TA401-492 Materials of engineering and construction. Mechanics of materials
Hussin, Rosniza
Kwang, Leong Choy
Xianghui, Hou
The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)
description "ALD is a precision growth technique that can deposit either amorphous or polycrystalline thin films on a variety of substrates. The difference in substrate can cause a variation in the ALD process, even it is carried out using the same reactants and deposition conditions [1]. TiO2 thin films were grown using TTIP (Titanium isopropoxide) ALD on silicon wafers, glass slides, and stainless steel plates in order to study the effect of substrates on the growth of TiO2 with 3,000 deposition cycles, at 300oC.The thin films were analyzed using Xray Diffraction (XRD), Raman Spectroscopy, Atomic Force Microscope (AFM) and Spectroscopic Ellipsometer. The XRD analysis indicates that the main diffraction peak of (101) (2_= 25.3) could be indexed to anatase TiO2, regardless the types of substrates. The results show that crystalline TiO2 thin films could be grown easily on a crystal substrate rather than on an amorphous substrate."
format Article
author Hussin, Rosniza
Kwang, Leong Choy
Xianghui, Hou
author_facet Hussin, Rosniza
Kwang, Leong Choy
Xianghui, Hou
author_sort Hussin, Rosniza
title The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)
title_short The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)
title_full The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)
title_fullStr The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)
title_full_unstemmed The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)
title_sort effect of substrate on tio2 thin films deposited by atomic layer deposition (ald)
publisher Trans Tech Publications, Switzerland
publishDate 2015
url http://eprints.uthm.edu.my/4878/1/AJ%202015%20%2844%29.pdf
http://eprints.uthm.edu.my/4878/
http://dx.doi.org/10.4028/www.scientific.net/AMR.1087.147
_version_ 1738581308887531520
score 13.211869

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