The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)
"ALD is a precision growth technique that can deposit either amorphous or polycrystalline thin films on a variety of substrates. The difference in substrate can cause a variation in the ALD process, even it is carried out using the same reactants and deposition conditions [1]. TiO2 thin films...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Trans Tech Publications, Switzerland
2015
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| Subjects: | |
| Online Access: | http://eprints.uthm.edu.my/4878/1/AJ%202015%20%2844%29.pdf http://eprints.uthm.edu.my/4878/ http://dx.doi.org/10.4028/www.scientific.net/AMR.1087.147 |
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