Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed Target
TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al...
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Trans Tech Publications, Switzerland
2013
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my.utem.eprints.109542015-05-28T04:14:28Z http://eprints.utem.edu.my/id/eprint/10954/ Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed Target Mohd Rosli, z.m.rosli Kwan, Wai Loon Jariah, Mohamad Juoi Nafarizal , Nayan Zainab , Mahamud Yusliza, Yusuf Q Science (General) TA Engineering (General). Civil engineering (General) TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB2 amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB2 nanocomposite. On theother hand, it was found that optimum bias voltage used in present study is -60 V where the deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the coatings deposited at -60V bias voltage is classified as HF 1 evaluated using the Rockwell-C adhesion test method (developed by the Union of German Engineers). Trans Tech Publications, Switzerland 2013 Article PeerReviewed application/pdf en http://eprints.utem.edu.my/id/eprint/10954/1/Wai_Loon_2.pdf Mohd Rosli, z.m.rosli and Kwan, Wai Loon and Jariah, Mohamad Juoi and Nafarizal , Nayan and Zainab , Mahamud and Yusliza, Yusuf (2013) Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed Target. Advanced Materials Research, Vol. 626 (2013). pp. 298-301. ISSN 1022-6680 http://www.scopus.com/results/results.url?sort=plf-f&src=s&st1=z.m.rosli&sid=FD010EC1B79325833808BC93B26574F7.CnvicAmOODVwpVrjSeqQ%3a40&sot=b&sdt=b&sl=22&s=AUTHOR-NAME%28z.m.rosli%29&origin=searchbasic&txGid=FD010EC1B79325833808BC93B26574F7.CnvicAmOODVwpV 10.4028/www.scientific.net/AMR.626.298 |
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Q Science (General) TA Engineering (General). Civil engineering (General) Mohd Rosli, z.m.rosli Kwan, Wai Loon Jariah, Mohamad Juoi Nafarizal , Nayan Zainab , Mahamud Yusliza, Yusuf Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed Target |
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TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB2 amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB2 nanocomposite. On theother hand, it was found that optimum bias voltage used in present study is -60 V where the deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the coatings deposited at -60V bias voltage is classified as HF 1 evaluated using the Rockwell-C adhesion test method (developed by the Union of German Engineers). |
format |
Article |
author |
Mohd Rosli, z.m.rosli Kwan, Wai Loon Jariah, Mohamad Juoi Nafarizal , Nayan Zainab , Mahamud Yusliza, Yusuf |
author_facet |
Mohd Rosli, z.m.rosli Kwan, Wai Loon Jariah, Mohamad Juoi Nafarizal , Nayan Zainab , Mahamud Yusliza, Yusuf |
author_sort |
Mohd Rosli, z.m.rosli |
title |
Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed
Target |
title_short |
Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed
Target |
title_full |
Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed
Target |
title_fullStr |
Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed
Target |
title_full_unstemmed |
Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed
Target |
title_sort |
characterization of tialbn nanocomposite coating deposited via radio frequency magnetron sputtering using single hot-pressed
target |
publisher |
Trans Tech Publications, Switzerland |
publishDate |
2013 |
url |
http://eprints.utem.edu.my/id/eprint/10954/1/Wai_Loon_2.pdf http://eprints.utem.edu.my/id/eprint/10954/ http://www.scopus.com/results/results.url?sort=plf-f&src=s&st1=z.m.rosli&sid=FD010EC1B79325833808BC93B26574F7.CnvicAmOODVwpVrjSeqQ%3a40&sot=b&sdt=b&sl=22&s=AUTHOR-NAME%28z.m.rosli%29&origin=searchbasic&txGid=FD010EC1B79325833808BC93B26574F7.CnvicAmOODVwpV |
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1665905442284371968 |
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13.211869 |