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Parallel scanning near-field photolithography: the Snomipede

The “Millipede”, developed by Binnig and co-workers (Bining, G. K.; et al. IBM J. Res. Devel. 2000, 44, 323.), elegantly solves the problem of the serial nature of scanning probe lithography processes, by deploying massive parallelism. Here we fuse the “Millipede” concept with scanning near-field ph...

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Main Authors: Ul-Haq, Ehtsham, Liu, Zhuming, Zhang, Yuan, Alang Ahmad, Shahrul Ainliah, Wong, Lu Shin, Armes, Steven P., Hobbs, Jamie K., Leggett, Graham J., Micklefield, Jason, Roberts, Clive J., Weaver, John M. R.
Format: Article
Language:English
Published: American Chemical Society 2010
Online Access:http://psasir.upm.edu.my/id/eprint/16036/1/Parallel%20scanning%20near-field%20photolithography%20%20the%20snomipede..pdf
http://psasir.upm.edu.my/id/eprint/16036/
http://pubs.acs.org/doi/abs/10.1021/nl1018782
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spelling my.upm.eprints.160362016-08-24T02:07:30Z http://psasir.upm.edu.my/id/eprint/16036/ Parallel scanning near-field photolithography: the Snomipede Ul-Haq, Ehtsham Liu, Zhuming Zhang, Yuan Alang Ahmad, Shahrul Ainliah Wong, Lu Shin Armes, Steven P. Hobbs, Jamie K. Leggett, Graham J. Micklefield, Jason Roberts, Clive J. Weaver, John M. R. The “Millipede”, developed by Binnig and co-workers (Bining, G. K.; et al. IBM J. Res. Devel. 2000, 44, 323.), elegantly solves the problem of the serial nature of scanning probe lithography processes, by deploying massive parallelism. Here we fuse the “Millipede” concept with scanning near-field photolithography to yield a “Snomipede” that is capable of executing parallel chemical transformations at high resolution over macroscopic areas. Our prototype has sixteen probes that are separately controllable using a methodology that is, in principle, scalable to much larger arrays. Light beams generated by a spatial modulator or a zone plate array are coupled to arrays of cantilever probes with hollow, pyramidal tips. We demonstrate selective photodeprotection of nitrophenylpropyloxycarbonyl-protected aminosiloxane monolayers on silicon dioxide and subsequent growth of nanostructured polymer brushes by atom-transfer radical polymerization, and the fabrication of 70 nm structures in photoresist by a Snomipede probe array immersed under water. Such approaches offer a powerful means of integrating the top-down and bottom-up fabrication paradigms, facilitating the reactive processing of materials at nanometer resolution over macroscopic areas. American Chemical Society 2010 Article PeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/16036/1/Parallel%20scanning%20near-field%20photolithography%20%20the%20snomipede..pdf Ul-Haq, Ehtsham and Liu, Zhuming and Zhang, Yuan and Alang Ahmad, Shahrul Ainliah and Wong, Lu Shin and Armes, Steven P. and Hobbs, Jamie K. and Leggett, Graham J. and Micklefield, Jason and Roberts, Clive J. and Weaver, John M. R. (2010) Parallel scanning near-field photolithography: the Snomipede. Nano Letters, 10 (11). pp. 4375-4380. ISSN 1530-6984; ESSN: 1530-6992 http://pubs.acs.org/doi/abs/10.1021/nl1018782 10.1021/nl1018782
institution Universiti Putra Malaysia
building UPM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Putra Malaysia
content_source UPM Institutional Repository
url_provider http://psasir.upm.edu.my/
language English
description The “Millipede”, developed by Binnig and co-workers (Bining, G. K.; et al. IBM J. Res. Devel. 2000, 44, 323.), elegantly solves the problem of the serial nature of scanning probe lithography processes, by deploying massive parallelism. Here we fuse the “Millipede” concept with scanning near-field photolithography to yield a “Snomipede” that is capable of executing parallel chemical transformations at high resolution over macroscopic areas. Our prototype has sixteen probes that are separately controllable using a methodology that is, in principle, scalable to much larger arrays. Light beams generated by a spatial modulator or a zone plate array are coupled to arrays of cantilever probes with hollow, pyramidal tips. We demonstrate selective photodeprotection of nitrophenylpropyloxycarbonyl-protected aminosiloxane monolayers on silicon dioxide and subsequent growth of nanostructured polymer brushes by atom-transfer radical polymerization, and the fabrication of 70 nm structures in photoresist by a Snomipede probe array immersed under water. Such approaches offer a powerful means of integrating the top-down and bottom-up fabrication paradigms, facilitating the reactive processing of materials at nanometer resolution over macroscopic areas.
format Article
author Ul-Haq, Ehtsham
Liu, Zhuming
Zhang, Yuan
Alang Ahmad, Shahrul Ainliah
Wong, Lu Shin
Armes, Steven P.
Hobbs, Jamie K.
Leggett, Graham J.
Micklefield, Jason
Roberts, Clive J.
Weaver, John M. R.
spellingShingle Ul-Haq, Ehtsham
Liu, Zhuming
Zhang, Yuan
Alang Ahmad, Shahrul Ainliah
Wong, Lu Shin
Armes, Steven P.
Hobbs, Jamie K.
Leggett, Graham J.
Micklefield, Jason
Roberts, Clive J.
Weaver, John M. R.
Parallel scanning near-field photolithography: the Snomipede
author_facet Ul-Haq, Ehtsham
Liu, Zhuming
Zhang, Yuan
Alang Ahmad, Shahrul Ainliah
Wong, Lu Shin
Armes, Steven P.
Hobbs, Jamie K.
Leggett, Graham J.
Micklefield, Jason
Roberts, Clive J.
Weaver, John M. R.
author_sort Ul-Haq, Ehtsham
title Parallel scanning near-field photolithography: the Snomipede
title_short Parallel scanning near-field photolithography: the Snomipede
title_full Parallel scanning near-field photolithography: the Snomipede
title_fullStr Parallel scanning near-field photolithography: the Snomipede
title_full_unstemmed Parallel scanning near-field photolithography: the Snomipede
title_sort parallel scanning near-field photolithography: the snomipede
publisher American Chemical Society
publishDate 2010
url http://psasir.upm.edu.my/id/eprint/16036/1/Parallel%20scanning%20near-field%20photolithography%20%20the%20snomipede..pdf
http://psasir.upm.edu.my/id/eprint/16036/
http://pubs.acs.org/doi/abs/10.1021/nl1018782
_version_ 1643826100203159552
score 13.211869

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