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HF etching of sacrificial spin-on glass in straight and junctioned microchannels for MEMS microstructure release

Sacrificial spin-on glass (SOG) etching in straight and junctioned microchannels using hydrofluoric acid (HF) was investigated. SOG etch rates in both reaction-dominant and diffusion-dominant regimes for various HF concentrations were studied. An etching model based on a non-first-order chemical rea...

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Main Authors:	Hamzah, A.A., Majlis, B.Y., Ahmad, I.
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出版:	2017
在线阅读:	http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5296
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