HF etching of sacrificial spin-on glass in straight and junctioned microchannels for MEMS microstructure release
Sacrificial spin-on glass (SOG) etching in straight and junctioned microchannels using hydrofluoric acid (HF) was investigated. SOG etch rates in both reaction-dominant and diffusion-dominant regimes for various HF concentrations were studied. An etching model based on a non-first-order chemical rea...
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| 主要な著者: | , , |
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2017
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| オンライン･アクセス: | http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5296 |
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