Design and optimization of 22nm NMOS transistor

In this paper, we investigate the effects of four process parameters and two process noise parameters on the threshold voltage (V th) of a 22nm NMOS transistor. We used TiO 2 as the high-k material to replace the SiO 2 dielectric. The NMOS transistor was simulated using the fabrication tool ATHENA a...

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主要な著者: Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S., Elgomati H.A., Majlis B.Y., Salehuddin F.
その他の著者: 36570222300
フォーマット: 論文
出版事項: 2023
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spelling my.uniten.dspace-295072023-12-28T14:30:17Z Design and optimization of 22nm NMOS transistor Afifah Maheran A.H. Menon P.S. Ahmad I. Shaari S. Elgomati H.A. Majlis B.Y. Salehuddin F. 36570222300 57201289731 12792216600 6603595092 36536722700 6603071546 36239165300 22nm NMOS ANOVA Orthogonal array Taguchi method Threshold voltage In this paper, we investigate the effects of four process parameters and two process noise parameters on the threshold voltage (V th) of a 22nm NMOS transistor. We used TiO 2 as the high-k material to replace the SiO 2 dielectric. The NMOS transistor was simulated using the fabrication tool ATHENA and electrical characterization was simulated using ATLAS. Taguchi's experimental design strategy was implemented with the L9 orthogonal array for conducting 36 simulation runs. The simulators were used for computing V th values for each row of the L9 array with 4 combinations of the 2 noise factors. The objective function for minimizing the variance in V th is achieved using Taguchi's nominal-the-best signal-to-noise ratio (SNR). Analysis of Mean (ANOM) was used to determine the best settings for the process parameters whereas. Analysis of variance (ANOVA) was used to reduce the variability of Vth. The best settings were used for verification experiments and the results show V th values with the least variance and that the mean value can be adjusted to 0.306V �0.027 for the 22nm NMOS, which is well within the ITRS2011 specifications. Final 2023-12-28T06:30:17Z 2023-12-28T06:30:17Z 2012 Article 2-s2.0-84867909824 https://www.scopus.com/inward/record.uri?eid=2-s2.0-84867909824&partnerID=40&md5=1288beeeeb2cdaf1e9ef33212df51e1b https://irepository.uniten.edu.my/handle/123456789/29507 6 7 1 8 Scopus
institution Universiti Tenaga Nasional
building UNITEN Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
url_provider http://dspace.uniten.edu.my/
topic 22nm NMOS
ANOVA
Orthogonal array
Taguchi method
Threshold voltage
spellingShingle 22nm NMOS
ANOVA
Orthogonal array
Taguchi method
Threshold voltage
Afifah Maheran A.H.
Menon P.S.
Ahmad I.
Shaari S.
Elgomati H.A.
Majlis B.Y.
Salehuddin F.
Design and optimization of 22nm NMOS transistor
description In this paper, we investigate the effects of four process parameters and two process noise parameters on the threshold voltage (V th) of a 22nm NMOS transistor. We used TiO 2 as the high-k material to replace the SiO 2 dielectric. The NMOS transistor was simulated using the fabrication tool ATHENA and electrical characterization was simulated using ATLAS. Taguchi's experimental design strategy was implemented with the L9 orthogonal array for conducting 36 simulation runs. The simulators were used for computing V th values for each row of the L9 array with 4 combinations of the 2 noise factors. The objective function for minimizing the variance in V th is achieved using Taguchi's nominal-the-best signal-to-noise ratio (SNR). Analysis of Mean (ANOM) was used to determine the best settings for the process parameters whereas. Analysis of variance (ANOVA) was used to reduce the variability of Vth. The best settings were used for verification experiments and the results show V th values with the least variance and that the mean value can be adjusted to 0.306V �0.027 for the 22nm NMOS, which is well within the ITRS2011 specifications.
author2 36570222300
author_facet 36570222300
Afifah Maheran A.H.
Menon P.S.
Ahmad I.
Shaari S.
Elgomati H.A.
Majlis B.Y.
Salehuddin F.
format Article
author Afifah Maheran A.H.
Menon P.S.
Ahmad I.
Shaari S.
Elgomati H.A.
Majlis B.Y.
Salehuddin F.
author_sort Afifah Maheran A.H.
title Design and optimization of 22nm NMOS transistor
title_short Design and optimization of 22nm NMOS transistor
title_full Design and optimization of 22nm NMOS transistor
title_fullStr Design and optimization of 22nm NMOS transistor
title_full_unstemmed Design and optimization of 22nm NMOS transistor
title_sort design and optimization of 22nm nmos transistor
publishDate 2023
_version_ 1806428510176149504
score 13.250246