The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
Pulsed Pressure-Chemical Vapour Deposition (PP-CVD) is a thin film deposition process which employs a highly unsteady flow with wide dynamic range of pressure. The large, time-varying density gradient during a PP-CVD process cycle produces a flow field in which the Knudsen number varies from the nea...
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2023
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