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The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition

Pulsed Pressure-Chemical Vapour Deposition (PP-CVD) is a thin film deposition process which employs a highly unsteady flow with wide dynamic range of pressure. The large, time-varying density gradient during a PP-CVD process cycle produces a flow field in which the Knudsen number varies from the nea...

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書誌詳細
主要な著者:	Lim C.W., Smith M.R., Cave H.M., Jermy M.C., Wu J.-S., Krumdieck S.P.
その他の著者:	35722335000
フォーマット:	論文
出版事項:	2023
主題:	Forward-facing cylinder Gas kinetic solver Numerical dissipation PP-CVD QDS Shock-bubble interaction Computer simulation Deposition Flow fields Unsteady flow Vapors Kinetic solvers Chemical vapor deposition
タグ:	タグ追加タグなし, このレコードへの初めてのタグを付けませんか!

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