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The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition

Pulsed Pressure-Chemical Vapour Deposition (PP-CVD) is a thin film deposition process which employs a highly unsteady flow with wide dynamic range of pressure. The large, time-varying density gradient during a PP-CVD process cycle produces a flow field in which the Knudsen number varies from the nea...

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Main Authors: Lim C.W., Smith M.R., Cave H.M., Jermy M.C., Wu J.-S., Krumdieck S.P.
Other Authors: 35722335000
Format: Article
Published: 2023
Subjects:
Forward-facing cylinder
Gas kinetic solver
Numerical dissipation
PP-CVD
QDS
Shock-bubble interaction
Computer simulation
Deposition
Flow fields
Unsteady flow
Vapors
Kinetic solvers
Chemical vapor deposition
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spelling my.uniten.dspace-294362023-12-28T12:13:04Z The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition Lim C.W. Smith M.R. Cave H.M. Jermy M.C. Wu J.-S. Krumdieck S.P. 35722335000 55698375700 8949775600 6603348158 23669619500 6601976510 Forward-facing cylinder Gas kinetic solver Numerical dissipation PP-CVD QDS Shock-bubble interaction Computer simulation Deposition Flow fields Unsteady flow Vapors Kinetic solvers Numerical dissipation PP-CVD QDS Shock-bubble interaction Chemical vapor deposition Pulsed Pressure-Chemical Vapour Deposition (PP-CVD) is a thin film deposition process which employs a highly unsteady flow with wide dynamic range of pressure. The large, time-varying density gradient during a PP-CVD process cycle produces a flow field in which the Knudsen number varies from the near-continuum to the rarefied regimes, making Direct Simulation Monte Carlo (DSMC) prohibitively expensive. The present directional decoupled Quiet Direct Simulation (DD-QDS) method is a novel kinetic-based flux scheme that computes fluxes of mass, momentum and energy at the interface of computational cells in a highly computationally efficient manner. The Maxwell-Boltzmann equilibrium distribution is enforced locally at each computational cell at each time step. In this paper, an axisymmetric second order directional decoupled QDS scheme is used to simulate highly unsteady flows encountered in PP-CVD reactor. Two simulations were conducted to investigate the PP-CVD reactor flow field at 1. Pa and 1. kPa reactor base pressures. The assumption of the local Maxwell-Boltzmann equilibrium distribution used in the QDS scheme is verified by examining the gradient length local Knudsen number based on the density, and by estimating the average number of molecular collisions within each computational cell in one computational time step. The validity of the local equilibrium assumption is found satisfactory at 1. kPa reactor based pressure but not at 1. Pa. The limitation of the QDS scheme in modelling PP-CVD flow was also investigated. The time required to establish the quasi-steady under-expanded jet is found to be ~4. ms, and the jet dissipates within 0.5. ms of the end of injection. This important information is required to set up PP-CVD operating conditions which give uniform film deposition. � 2013 Elsevier Ltd. Final 2023-12-28T04:13:04Z 2023-12-28T04:13:04Z 2013 Article 10.1016/j.compfluid.2013.07.012 2-s2.0-84882252581 https://www.scopus.com/inward/record.uri?eid=2-s2.0-84882252581&doi=10.1016%2fj.compfluid.2013.07.012&partnerID=40&md5=8a2707faf9dfd9b252fa4910c4098644 https://irepository.uniten.edu.my/handle/123456789/29436 86 14 27 Scopus
institution Universiti Tenaga Nasional
building UNITEN Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
url_provider http://dspace.uniten.edu.my/
topic Forward-facing cylinder
Gas kinetic solver
Numerical dissipation
PP-CVD
QDS
Shock-bubble interaction
Computer simulation
Deposition
Flow fields
Unsteady flow
Vapors
Kinetic solvers
Numerical dissipation
PP-CVD
QDS
Shock-bubble interaction
Chemical vapor deposition
spellingShingle Forward-facing cylinder
Gas kinetic solver
Numerical dissipation
PP-CVD
QDS
Shock-bubble interaction
Computer simulation
Deposition
Flow fields
Unsteady flow
Vapors
Kinetic solvers
Numerical dissipation
PP-CVD
QDS
Shock-bubble interaction
Chemical vapor deposition
Lim C.W.
Smith M.R.
Cave H.M.
Jermy M.C.
Wu J.-S.
Krumdieck S.P.
The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
description Pulsed Pressure-Chemical Vapour Deposition (PP-CVD) is a thin film deposition process which employs a highly unsteady flow with wide dynamic range of pressure. The large, time-varying density gradient during a PP-CVD process cycle produces a flow field in which the Knudsen number varies from the near-continuum to the rarefied regimes, making Direct Simulation Monte Carlo (DSMC) prohibitively expensive. The present directional decoupled Quiet Direct Simulation (DD-QDS) method is a novel kinetic-based flux scheme that computes fluxes of mass, momentum and energy at the interface of computational cells in a highly computationally efficient manner. The Maxwell-Boltzmann equilibrium distribution is enforced locally at each computational cell at each time step. In this paper, an axisymmetric second order directional decoupled QDS scheme is used to simulate highly unsteady flows encountered in PP-CVD reactor. Two simulations were conducted to investigate the PP-CVD reactor flow field at 1. Pa and 1. kPa reactor base pressures. The assumption of the local Maxwell-Boltzmann equilibrium distribution used in the QDS scheme is verified by examining the gradient length local Knudsen number based on the density, and by estimating the average number of molecular collisions within each computational cell in one computational time step. The validity of the local equilibrium assumption is found satisfactory at 1. kPa reactor based pressure but not at 1. Pa. The limitation of the QDS scheme in modelling PP-CVD flow was also investigated. The time required to establish the quasi-steady under-expanded jet is found to be ~4. ms, and the jet dissipates within 0.5. ms of the end of injection. This important information is required to set up PP-CVD operating conditions which give uniform film deposition. � 2013 Elsevier Ltd.
author2 35722335000
author_facet 35722335000
Lim C.W.
Smith M.R.
Cave H.M.
Jermy M.C.
Wu J.-S.
Krumdieck S.P.
format Article
author Lim C.W.
Smith M.R.
Cave H.M.
Jermy M.C.
Wu J.-S.
Krumdieck S.P.
author_sort Lim C.W.
title The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
title_short The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
title_full The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
title_fullStr The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
title_full_unstemmed The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
title_sort direction decoupled quiet direct simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
publishDate 2023
_version_ 1806423275855675392
score 13.211869

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