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Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication

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Main Authors: Sutikno, Madnasri, Uda, Hashim, Zul Azhar, Zahid Jamal
Format: Article
Language:English
Published: Springer New York 2009
Subjects:
Transistors
Integrated circuits > Design and construction
e-beam
Lithography, Electron beam
Integrated circuits
Electron beams
Lithography
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/6694
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spelling my.unimap-66942009-08-06T13:43:33Z Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication Sutikno, Madnasri Uda, Hashim Zul Azhar, Zahid Jamal Transistors Integrated circuits -- Design and construction e-beam Lithography, Electron beam Integrated circuits Electron beams Lithography Link to publisher's homepage at http://www.springerlink.com We present an optimization of nano dot of negative tone e-beam resist which is a very important step in single electron transistor fabrication process. The optimum design of dot and nano constriction plays a significant role in determining optimum etching resolution and single electron transistor performance. In this research, we have optimized nano dot and nano constriction dimensions of resist by controlling some parameters, such as e-beam dose, spin speed, pre-bake time and image development time. However, a nano constriction design variety of 120–200 nm in width was carried out to reach the optimum design. In this paper, the fabrication process of cone nano dots using e-beam lithography with considering proximity effect is reported. As nano constriction design decreased, cone nano dot changed to pyramid nano dot and the compression effect on the dot also significantly increased as well. 2009-08-06T13:43:09Z 2009-08-06T13:43:09Z 2007-12 Article Journal of Materials Science: Materials in Electronics, vol.18 (12), 2007, pages 1191-1195. 0957-4522 (Print) 1573-482X (Online) http://www.springerlink.com/content/g035825v8051l462/ http://hdl.handle.net/123456789/6694 en Springer New York
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Transistors
Integrated circuits -- Design and construction
e-beam
Lithography, Electron beam
Integrated circuits
Electron beams
Lithography
spellingShingle Transistors
Integrated circuits -- Design and construction
e-beam
Lithography, Electron beam
Integrated circuits
Electron beams
Lithography
Sutikno, Madnasri
Uda, Hashim
Zul Azhar, Zahid Jamal
Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
description Link to publisher's homepage at http://www.springerlink.com
format Article
author Sutikno, Madnasri
Uda, Hashim
Zul Azhar, Zahid Jamal
author_facet Sutikno, Madnasri
Uda, Hashim
Zul Azhar, Zahid Jamal
author_sort Sutikno, Madnasri
title Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
title_short Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
title_full Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
title_fullStr Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
title_full_unstemmed Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
title_sort nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
publisher Springer New York
publishDate 2009
url http://dspace.unimap.edu.my/xmlui/handle/123456789/6694
_version_ 1643788578736570368
score 13.211869

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